Mainly used in plasma etching equipment for LED substrate materials, semiconductor materials, and epitaxial materials, it provides excellent protection for the etching chamber of the equipment.
The materials are high-purity alumina ceramics, zirconia ceramics, and silicon carbide ceramics, which have high hardness, wear resistance, good precision retention, and excellent resistance to plasma bombardment. High purity and high-performance engineering ceramic materials can effectively solve problems such as plasma corrosion, particle generation, metal pollution, and oxygen decomposition in the new generation of etching technology. Purity ≥ 99.8%, with excellent resistance to plasma etching, can be customized non-standard.
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