Etching Ceramic Ring
Mainly used in plasma etching equipment for LED substrate materials, semiconductor materials, and epitaxial materials, it provides excellent protection for the etching chamber of the equipment.
The materials are high-purity alumina ceramics, zirconia ceramics, and silicon carbide ceramics, which have high hardness, wear resistance, good precision retention, and excellent resistance to plasma bombardment. High purity and high-performance engineering ceramic materials can effectively solve problems such as plasma corrosion, particle generation, metal pollution, and oxygen decomposition in the new generation of etching technology. Purity ≥ 99.8%, with excellent resistance to plasma etching, can be customized non-standard.
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